The main objective of this paper is to explain the various types of design rule checks (DRC) violation, their causes and how to fix the various design rule checks (DRC) at lower technology node on ...
Lam Research Establishes 28nm Pitch in High-Resolution Patterning Through Dry Photoresist Technology
As chipmakers move to advanced technology nodes, transistor features and pitch sizes continue to get smaller. Ambitious next-generation device roadmaps require direct-print 28nm pitch BEOL to ...
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